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Search for "micelle lithography" in Full Text gives 3 result(s) in Beilstein Journal of Nanotechnology.

Self-assembled quasi-hexagonal arrays of gold nanoparticles with small gaps for surface-enhanced Raman spectroscopy

  • Emre Gürdal,
  • Simon Dickreuter,
  • Fatima Noureddine,
  • Pascal Bieschke,
  • Dieter P. Kern and
  • Monika Fleischer

Beilstein J. Nanotechnol. 2018, 9, 1977–1985, doi:10.3762/bjnano.9.188

Graphical Abstract
  • method, which enables the parallel processing of large areas. A cost-effective photochemical method is block copolymer micelle lithography (BCML), which can be used to create templates on the surfaces of substrates [10][11][12]. To use the templates for further patterning of the substrate with nanodots
  • near-field-enhanced bio-analytics of molecules. SERS was demonstrated by measuring Raman spectra of 4-MBA on the gold nanoparticles. It was verified that a smaller inter-particle distance leads to an increased SERS signal. Keywords: block copolymer; electroless deposition; gold nanoparticles; micelle
  • lithography; optical antenna; self-assembly; SERS; Introduction Over the last decades self-assembled layers of gold nanoparticles have taken an important role in emerging nanotechnologies. Noble metal nanoparticles show localized surface plasmon polariton resonances (LSPRs) in the visible and infrared
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Published 12 Jul 2018

Cyclic photochemical re-growth of gold nanoparticles: Overcoming the mask-erosion limit during reactive ion etching on the nanoscale

  • Burcin Özdemir,
  • Axel Seidenstücker,
  • Alfred Plettl and
  • Paul Ziemann

Beilstein J. Nanotechnol. 2013, 4, 886–894, doi:10.3762/bjnano.4.100

Graphical Abstract
  • -coating as well as the plasma processes can be found in [6]. Thus, in the present context it may suffice to describe how the method, often addressed as block copolymer micelle lithography (BCML), meets the above requirements. For a given copolymer like PS(1850)-b-P2VP(900) in toluene (the monomer numbers
  • etching progress is presented in panels c)–e) and the associated linear relation between total pillar height and etching time is summarized in f). In accordance with Figure 3d an average SiO2 etching rate of 5.3 nm/min is extracted from these data. Conclusion Though block copolymer micelle lithography
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Published 12 Dec 2013

Fabrication of multi-parametric platforms based on nanocone arrays for determination of cellular response

  • Lindarti Purwaningsih,
  • Tobias Schoen,
  • Tobias Wolfram,
  • Claudia Pacholski and
  • Joachim P. Spatz

Beilstein J. Nanotechnol. 2011, 2, 545–551, doi:10.3762/bjnano.2.58

Graphical Abstract
  • has been fabricated by a combination of block copolymer micelle lithography (BCML), electroless deposition (ED) and reactive ion etching (RIE). The resulting highly ordered silica nanocone array with gold tips allows for the investigation of several parameters in cell studies at the same time, that is
  • of the nanocone arrays. Results and Discussion Scheme 1 shows the fabrication process for nanocone arrays with gold tips. First, arrays of gold nanoparticles were deposited on a glass surface by diblock copolymer micelle lithography (BCML); this is a versatile technique which allows for the
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Published 06 Sep 2011
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